157-nm laser-induced modification of fused-silica glasses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4274, Issue , 2001, Pages 125-132

  Zhang, Jie ^a   Herman, Peter R ^a   Lauer, Christian ^a   Chen, Kevin P ^a   Wei, Midori ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

Color center; F2 laser; Fused silica; Laser damage; Photosensitivity; Refractive index

Indexed keywords

COLOR CENTERS; GLASS; HYDROGEN; LASER APPLICATIONS; LASER DAMAGE; LIGHT SENSITIVE MATERIALS; MANUFACTURE; MICROELECTRONICS; PHOTOSENSITIVITY; REFRACTIVE INDEX; SEMICONDUCTOR QUANTUM WELLS;

157 NM LASER; DOPED GLASS; F2 LASERS; HIGH PRESSURE HYDROGEN; MATERIAL ABSORPTION; REFRACTIVE INDEX CHANGES; SURFACE RELIEF GRATINGS; VOLUME GRATINGS;

FUSED SILICA;

EID: 0010696888     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.432504     Document Type: Conference Paper

References (12)

1. H. Hosono, M. Mizuguchi, L. Skuja and T. Ogawa, "Fluorine-doped SiO2 glasses for F2 excimer laser optics: fluorine content and color-center formation" Opt. Lett., 24, 1549 (1999).
2. R. Kashyap, Fiber Bragg Grating (Academy Press 1999).
3. M. Rothschild, D.J. Ehrlich and D.C. Shaver, "Effects of excimer laser irradiation on the tranmission, index of refraction", Appl. Phys. Lett., 55, 1276 (1989).
4. P. R. Herman, R. S. Marjoribanks, A. Oettl, K. Chen, I. Konovalov, S. Ness, "Laser shaping of photonic materials: deep-ultraviolet and ultrafast lasers", Appl. Surf. Sci, 154-155, 577 (1999).
5. D. C. Allan, C. Smith, N. F. Borrelli and T.P. Seward III, "193nm excimer-laser-induced densification of fused silica", Opt. Lett., 21, 1960 (1996)
6. N.F. Borreli, C. Smith, D. C. Allan and T.P. Seward III, "Excimer-laser-induced densification in binary silica glasses" Opt. Lett., 24, 1401 (1999).
7. K.M. Davis, K. Miura, N. Sugimoto and K. Hirao, "Writing waveguides in glass with a femtosecond laser", Opt. Lett., 21, 1729 (1996).
8. P. R. Herman, K. P. Chen, P. Corkum, A. Naumov, S. Ng, J. Zhang, "Advanced laser microfabrication of photonic components", Proc. SPIE, 2000, Vol. 4088 (in press)
9. N. Kitamura, Y. Toguchi, S. Funo, H. Yamashita and M. Kinoshita, "Refractive index of densified silica glass", J. Non-crystal. Solid 159, pp 241-245 (1993).
10. C. Lauer, "Modeling of phase mask", Internal Research Report, University of Toronto (2000).
11. J. Zhang, P. R. Herman, K. P. Chen, C. Lauer and M. Wei, "Photochemical reaction of hydrogen with OH groups in 157-nm laser photosensitivity of OH-containing fused silica" (submitted to Opt. Lett.)
12. J. Zhang, P. R. Herman, C. Lauer, K. P. Chen, "157 nm-laser induced photosensitivity in H2-loaded fused silica" (submitted to Appl. Phys. Lett.)