Modeling of acid copper anisotropic deposition based on detailed calculation of the electrolyte composition

Journal of the Electrochemical Society

Volumn 150, Issue 1, 2003, Pages

  Wu, Bang Hao ^a   Wan, Chi Chao ^a   Wang, Yung Yun ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; COPPER; DISSOCIATION; ELECTRODEPOSITION; IONS; MATHEMATICAL MODELS; SULFURIC ACID;

ANISOTROPIC DEPOSITION; COPPER SULFATE;

ELECTROLYTES;

EID: 0037258345     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1522385     Document Type: Article

References (22)

1. A. C. West, C. C. Cheng, and Brett C. Baker, J. Electrochem. Soc., 145, 3070 (1998).
2. A. C. West, J. Electrochem. Soc., 147, 227 (2000).
3. J. O. Dukovic, IBM J. Res. Dev., 37, 125 (1993).
4. D. Varadarajan, C. Y. Lee, A. Krishnamoorthy, D. J. Dquette, and W. N. Gill, J. Electrochem. Soc., 147, 3382 (2000).
5. J. Newman, Electrochemical System, 2nd ed., Prentice-Hall, Berkeley, CA (1991).
6. D. A. Hazlebeck and J. B. Talbot, AIChE J., 36, 1145 (1990).
7. S. Wasylkiewicz and J. Piotrowicz, Comput. Chem. Eng., 12, 141 (1988).
8. S. Wasylkiewicz, Fluid Phase Equilib., 57, 277 (1990).
9. J. M. Casas, F. Alvarez, and L. Cifuentes, Chem. Eng. Sci., 55, 6223 (2000).
10. K. S. Pitzer, Thermodynamics, 3rd ed., McGraw-Hill, New York (1995).
11. K. S. Pitzer, J. Chem. Soc., Faraday Trans. 2, 68, 101 (1972).
12. K. S. Pitzer, R. N. Roy, and L. F. Silvester, J. Am. Chem. Soc., 99, 4930 (1977).
13. C. C. Chen, H. I. Britt, J. F. Boston, and L. B. Evans, AIChE J., 25, 820 (1979).
14. C. F. Baes, Jr., J. Reardon, and B. A. Moyer, J. Phys. Chem., 97, 12343 (1993).
15. P. G. M. Brown and J. E. Prue, Proc. R. Soc. Edinburgh, Sect. A: Math. Phys. Sci., 232, 320 (1955).
16. D. C. Price and W. G. Davenport, Metall. Trans. B, 11B, 159 (1980).
17. R. Cabán and T. W. Chapman, J. Electochem. Soc., 124, 1371 (1977).
18. R. Y. Zing, Z. Mao, and R. E. White, J. Electrochem. Soc., 135, 2964 (1988).
19. Y. Awakura and T. Doi, Metall. Trans. B, 19, 5 (1988).
20. C. Wagner, J. Electrochem. Soc., 98, 116 (1951).
21. K. M. Takahashi and M. E. Gross, J. Electrochem. Soc., 146, 4499 (1999).
22. P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev., 42, 567 (1998).