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Volumn 145, Issue 9, 1998, Pages 3070-3074
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Pulse reverse copper electrodeposition in high aspect ratio trenches and vias
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ASPECT RATIO;
ELECTROPLATING;
MATHEMATICAL MODELS;
WAVEFORM ANALYSIS;
PULSE REVERSE ELECTRODEPOSITION;
COPPER PLATING;
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EID: 0032166866
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1838766 Document Type: Article |
Times cited : (94)
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References (12)
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