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Volumn 24, Issue 1, 2003, Pages 25-27

Compensated back-channel TFTs in hydrogenated amorphous silicon

Author keywords

Amorphous semiconductors; Compensation; FETs; Semiconductor device fabrication; Thin film transistors

Indexed keywords

AMORPHOUS SILICON; ELECTRON MOBILITY; ETCHING; FIELD EFFECT TRANSISTORS; HYDROGENATION; IMPURITIES; LEAKAGE CURRENTS; OHMIC CONTACTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

EID: 0037246524     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2002.807017     Document Type: Letter
Times cited : (3)

References (8)
  • 1
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    • Norwell, MA: Artech House
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    • (1992) Amorphous and Microcrystalline Semiconductor Devices , vol.2 , pp. 400-402
    • Van Berkel, C.1
  • 2
    • 0004123419 scopus 로고
    • Cambridge, U.K: Cambridge Univ. Press
    • R. A. Street, Hydrogenated Amorphous Silicon. Cambridge, U.K: Cambridge Univ. Press, 1991, pp. 155-168.
    • (1991) Hydrogenated Amorphous Silicon , pp. 155-168
    • Street, R.A.1
  • 3
    • 0032047954 scopus 로고    scopus 로고
    • Barrier height changes in amorphous silicon schottky diodes following dopant implantation
    • M. K. Chai, J. M. Shannon, and B. J. Sealy, "Barrier height changes in amorphous silicon schottky diodes following dopant implantation," Electron. Lett., vol. 34, no. 9, pp. 919-921, 1998.
    • (1998) Electron. Lett. , vol.34 , Issue.9 , pp. 919-921
    • Chai, M.K.1    Shannon, J.M.2    Sealy, B.J.3
  • 4
    • 0000230470 scopus 로고    scopus 로고
    • Electronic effects of ion damage in hydrogenated amorphous silicon alloys
    • R. A. C. M. M. van Swaaij, A. D. Annis, B. J. Sealy, and J. M. Shannon, "Electronic effects of ion damage in hydrogenated amorphous silicon alloys," J. Appl. Phys., vol. 82, pp. 4800-4804, 1997.
    • (1997) J. Appl. Phys. , vol.82 , pp. 4800-4804
    • Van Swaaij, R.A.C.M.M.1    Annis, A.D.2    Sealy, B.J.3    Shannon, J.M.4
  • 5
    • 33645607953 scopus 로고
    • An experimental study of the source/drain parasitic resistance effects in amorphous silicon thin film transistors
    • S. Luan and G. W. Neudeck, "An experimental study of the source/drain parasitic resistance effects in amorphous silicon thin film transistors," J. Appl. Phys., vol. 72, pp. 766-772, 1992.
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    • Luan, S.1    Neudeck, G.W.2
  • 6
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    • An amorphous silicon thin-film transistor with fully self-aligned top gate structure
    • Mar.
    • M. J. Powell, C. Glasse, P. W. Green, I. D. French, and I. J. Stemp, "An amorphous silicon thin-film transistor with fully self-aligned top gate structure," IEEE Electron Device Lett., vol. 21, pp. 104-106, Mar. 2000.
    • (2000) IEEE Electron Device Lett. , vol.21 , pp. 104-106
    • Powell, M.J.1    Glasse, C.2    Green, P.W.3    French, I.D.4    Stemp, I.J.5
  • 7
    • 0030378323 scopus 로고    scopus 로고
    • Short-channel amorphous silicon thin-film devices
    • Dec.
    • C.-D. Kim and M. Matsumura, "Short-channel amorphous silicon thin-film devices," IEEE Trans. Electron Devices, vol. 43, pp. 2172-2176, Dec. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 2172-2176
    • Kim, C.-D.1    Matsumura, M.2
  • 8
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    • Hole transport via dangling-bond states in amorphous hydrogenated silicon
    • J. M. Shannon and B. A. Morgan, "Hole transport via dangling-bond states in amorphous hydrogenated silicon," J. Appl. Phys., vol. 86, pp. 1548-1551, 1999.
    • (1999) J. Appl. Phys. , vol.86 , pp. 1548-1551
    • Shannon, J.M.1    Morgan, B.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.