Surface relaxation processes of poly(methyl methacrylate) brushes prepared by atom transfer radical polymerization

Polymer Journal

Volumn 35, Issue 1, 2003, Pages 44-49

  Tanaka, Keiji ^a   Kojio, Ken ^a   Kimura, Reiko ^a   Takahara, Atsushi ^a   Kajiyama, Tisato ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Poly(methyl methacrylate) (PMMA); Polymer Brushes; Scanning Force Microscopy; Surface Molecular Motion

Indexed keywords

ATOMS; MOLECULAR WEIGHT; POLYMERIZATION; RELAXATION PROCESSES; SCANNING; SILICON WAFERS; SPIN COATING;

ATOM TRANSFER;

POLYMETHYL METHACRYLATES;

EID: 0037226662     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.35.44     Document Type: Article

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