Growth and thermal annealing of Cu on HfSiO4

Applied Surface Science

Volumn 201, Issue 1-4, 2002, Pages 171-181

  Park, H J ^a   Sun, Y M ^a   Lozano, J ^a   White, J M ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Growth; HfSiO4; Thermal annealing

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; COPPER; DEPOSITION; GROWTH (MATERIALS); INTERFACES (MATERIALS); STRAIN; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

LOW-ENERGY ION SCATTERING (LEIS);

HAFNIUM COMPOUNDS;

EID: 0037202590     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00885-1     Document Type: Article

References (17)

1. Diebold U., Pan J.-M., Madey T.E. Surf. Sci. 287/288 1993 896.
2. Chen D.A., Bartelt M.C., Hwang R.Q., McCarty K.F. Surf. Sci. 450 2000 78.
3. Ge Q., Møller P. Thin Solid Films 254 1995 10.
4. Xu X., He J.-W., Goodman D.W. Surf. Sci. 284 1993 103.
5. Wu Y., Garfunkel E., Madey T.E. J. Vac. Sci. Technol. A 14 1996 1662.
6. Wu M.-C., Goodman D.W. J. Phys. Chem. 98 1994 9874.
7. Wilk G.D., Wallace R.M., Anthony J.M. J. Appl. Phys. 87 2000 484.
8. A.W. Adamson, Physical Chemistry of Surfaces, Wiley, New York, 1990.
9. Overbury S.H., Bertrand P.A., Somorjai G.A. Chem. Rev. 75 1975 547.
10. H.J. Park, Y.-M. Sun, H. Troiani, P. Santiago, M.J. Yacaman, J.M. White, Surf. Sci., submitted for publication.
11. Sun Y.-M., Lozano J., Ho H., Park H.J., Veldman S., White J.M. Appl. Surf. Sci. 161 2000 115.
12. Q. Wang, Y.-M. Sun, W. Zhao, J. Campagna, J.M. White, Rev. Sci. Inst., in press.
13. Egelhoff W.F. Jr. Surf. Sci. Rep. 6 1987 253.
14. Fadley C.S. Prog. Surf. Sci. 16 1984 275.
15. Mao A.Y., Son K.-A., Hess D.A., Brown L.A., White J.M., Kwong D.L., Roberts D.A., Vrtis R.N. Thin Solid Films 349 1999 230.
16. Oslanec R., Costa A.C., Composto R.J. Macromolecules 33 2000 5505.
17. Tanuma S., Powell C.J. Surf. Interf. Anal. 17 1991 911.