Fabrication of UV-transparent SixOyNz membranes with a low frequency PECVD reactor

Sensors and Actuators, A: Physical

Volumn 99, Issue 1-2, 2002, Pages 78-81

  Danaie, K ^a   Bosseboeuf, A ^a,c   Clerc, C ^b   Gousset, C ^a   Julie, G ^a  

^a UNIV PARIS SUD   (France)

^b Bat 104   (France)

^c Tel: +33 1 69 157835 ^*  (France)

Author keywords

Bulk micromachining; Film stress; Membrane; Silicon oxynitride

Indexed keywords

DIELECTRIC MEMBRANES;

ANNEALING; CHEMICAL REACTORS; DEPOSITION; DESORPTION; DIELECTRIC MATERIALS; HYDROGEN; ION BOMBARDMENT; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SILICON NITRIDE; STOICHIOMETRY; STRESS ANALYSIS; TENSILE STRESS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0037197295     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00899-8     Document Type: Conference Paper

References (13)