AlN thin films deposition by laser ablation of Al target in nitrogen reactive atmosphere

Applied Surface Science

Volumn 109-110, Issue , 1997, Pages 371-375

  Verardi, P ^a   Dinescu, M ^b   Gerardi, C ^c   Mirenghi, L ^c   Sandu, V ^b  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

^b INSTITUTE OF ATOMIC PHYSICS   (Romania)

^c Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; INTERFACES (MATERIALS); LASER ABLATION; NITROGEN; OXYGEN; PIEZOELECTRICITY; PULSED LASER APPLICATIONS; SILICON WAFERS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

NITROGEN REACTIVE ATMOSPHERE; PULSED LASER DEPOSITION (PLD);

THIN FILMS;

EID: 0010306301     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00751-9     Document Type: Article

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