Probability theory of the velocity distribution of ions incident on a radio-frequency biased wafer

Vacuum

Volumn 65, Issue 1, 2002, Pages 11-17

  Nanbu, K ^a   Wakayama, G ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Ion energy distribution; Ion velocity distribution; Wafer biasing

Indexed keywords

GROUNDING ELECTRODES; IONS; PLASMA SOURCES; PROBABILITY;

RADIO-FREQUENCY BIASED WAFERS;

INDUCTIVELY COUPLED PLASMA;

EID: 0037176756     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00388-8     Document Type: Article

References (10)