Patterning of a micromechanical coplanar waveguide using a dry etching technique

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 283-287

  Hascik S ^a   Mozolova Z ^a   Lalinsky T ^a   Tomaska M ^b   Kostic I ^c  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^c INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

Coplanar waveguide; GaAs; InGaP; RIE

Indexed keywords

DRY ETCHING; ELECTRIC LINES; METALLIZING; MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTING GALLIUM ARSENIDE;

COPLANAR TRANSMISSION LINES;

WAVEGUIDES;

EID: 0037168567     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00346-9     Document Type: Conference Paper

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