Change of magnetized plasma performance by inserted voltage biased plate

Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 209-214

  Shinohara, S ^a   Matsuyama, S ^a   Kaneko, O ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

E B drift; Magnetized r.f. plasma; Plasma profile; Voltage biasing

Indexed keywords

BOUNDARY CONDITIONS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; IONS; MAGNETIC FIELDS; MAGNETIZATION; PLASMA DENSITY; PLASMA FLOW;

VOLTAGE BIASING;

MAGNETOPLASMA;

EID: 0037155453     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00040-8     Document Type: Conference Paper

References (18)