Effect of voltage biased plate on magnetized plasma distribution and flow

Fusion Technology

Volumn 39, Issue 1 T, 2001, Pages 362-365

  Matsuyama, S ^a   Shinohara, S ^a   Kaneko, O ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC FIELD EFFECTS; MAGNETIC FIELDS; MAGNETIZATION; PLASMA DENSITY; PLASMA FLOW; TWO DIMENSIONAL;

ARGON PLASMA; MACH PROBE MEASUREMENT; MAGNETIZED PLASMA DISTRIBUTION;

MAGNETOPLASMA;

EID: 0035079343     PISSN: 07481896     EISSN: None     Source Type: Journal    
DOI: 10.13182/fst01-a11963481     Document Type: Article

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