Control of plasma profile by voltage biasing in large diameter RF produced plasma

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 20-24

  Shinohara, Shunjiro ^a   Tsuji, Hiroshi ^a   Yoshinaka, Toshiro ^a   Kawai, Yoshinobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Large diameter; Profile control; RF plasma; Voltage biasing

Indexed keywords

ELECTRODES; PLASMA PROBES;

ION SATURATION CURRENT; PLASMA PROFILE; VOLTAGE BIASING;

PLASMA SOURCES;

EID: 0033077968     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00758-0     Document Type: Article

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