Production of 1-m size uniform plasma by modified magnetron-typed RF discharge with a subsidiary electrode for resonance

Thin Solid Films

Volumn 316, Issue 1-2, 1998, Pages 60-64

  Urano, Yuji ^b   Li, Yunlong ^b   Kanno, Keiichi ^a   Iizuka, Satoru ^a   Sato, Noriyoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b HITACHI KOKUSAI ELECTRIC INC   (Japan)

Author keywords

Large diameter plasma; RF discharge plasma; Uniform plasma

Indexed keywords

ELECTRODES; PLASMA DENSITY; PRESSURE EFFECTS; RESONANT CIRCUITS; SUBSTRATES;

PLASMA PRODUCTION;

PLASMA SOURCES;

EID: 0032028346     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00389-7     Document Type: Article

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