Plasma-density control in the magnetron-type RF plasma

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 241-244

  Li, Yunlong ^a   Lizuka, Satoru ^a   Sato, Noriyoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRIC IMPEDANCE; MAGNETIC RESONANCE; MAGNETRONS; PLASMA DENSITY; PLASMA OSCILLATIONS;

MAGNETRON TYPE RADIOFREQUENCY PLASMA; RADIOFREQUENCY IMPEDANCE;

PLASMA SOURCES;

EID: 0030134324     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/017     Document Type: Article

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