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Thin Solid Films

Volumn 405, Issue 1-2, 2002, Pages 73-76

The effect of HF vapor pre-treatment on the cobalt salicide process

(5) Lee, Sang Yun a,c Cao, Wanqing b Lee, Eric b Lo, Patrick b Lee, S K b

a AGERE SYSTEMS (United States)

b INTEGRATED DEVICE TECHNOLOGY INC (United States)

c STANFORD UNIVERSITY (United States)

Author keywords

Cobalt; CoSi2; HF vapor treatment; Oxide integrity

Indexed keywords

DIFFUSION; LEAKAGE CURRENTS; POLYSILICON; SEGREGATION (METALLOGRAPHY); SPUTTER DEPOSITION; SUBSTRATES;

GATE OXIDE INTEGRITY;

COBALT COMPOUNDS;

EID: 0037154941 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01747-3 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.