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Acta Materialia

Volumn 50, Issue 16, 2002, Pages 4191-4204

Changes in Cu-silica interfacial chemistry with oxygen chemical potential

(5) Backhaus Ricoult, M a,b Samet, L c,d Thomas, M e Trichet, M F a Imhoff, D c

a CNRS (France)

b Cornell University (United States)

c UNIVERSITÉ PARIS SUD (France)

d FACULTÉ DES SCIENCES DE TUNIS (Tunisia)

e Department of Obstetrics Gynecology (United States)

Author keywords

Copper and silica; Electronic structure; ELNES; Interface; Oxygen chemical potential

Indexed keywords

COPPER; DESORPTION; ELECTRONIC STRUCTURE; GAS ADSORPTION; OXIDATION; PHASE EQUILIBRIA; PRECIPITATION (CHEMICAL); SILICA; SINGLE CRYSTALS;

OXYGEN CHEMICAL POTENTIAL;

SURFACE CHEMISTRY;

EID: 0037144293 PISSN: 13596454 EISSN: None Source Type: Journal
DOI: 10.1016/S1359-6454(02)00267-7 Document Type: Article

Times cited : (18)

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