Internal stress of ZnO thin films caused by thickness distribution and crystallinity

Materials Research Society Symposium - Proceedings

Volumn 518, Issue , 1998, Pages 215-220

  Takeuchi, M ^a   Inoue, K ^a   Yoshino, Y ^a   Ohwada, K ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; FILM PREPARATION; MAGNETRON SPUTTERING; RESIDUAL STRESSES; STRESS CONCENTRATION; THICKNESS MEASUREMENT; THIN FILMS; X RAY CRYSTALLOGRAPHY;

CRYSTALLINITY; THICKNESS DISTRIBUTION;

ZINC OXIDE;

EID: 0032299773     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-518-215     Document Type: Conference Paper

References (8)