Effect of buffer electrodes in crystallization of zinc oxide thin film for thin film bulk acouctic wave resonator

Materials Research Society Symposium - Proceedings

Volumn 605, Issue , 2000, Pages 267-272

  Yoshino, Y ^a   Tsukai, N ^a   Inoue, K ^a   Takeuchi, M ^a   Nomura, T ^a   Makino, T ^a   Arai, S ^a   Hata, T ^b  

^a MURATA MANUFACTURING CO LTD   (Japan)

^b KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; CRYSTAL ORIENTATION; CRYSTALLIZATION; CRYSTALLOGRAPHY; ELECTRODES; MICROELECTRONIC PROCESSING; RESONATORS; SILICA; SPUTTER DEPOSITION; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BUFFER ELECTRODES; CRYSTALLINITY; MICROELECTROMECHANICAL SYSTEM; RESONANT CHARACTERISTICS; RESONANT RESISTANCE; TEMPERATURE COEFFICIENT OF FREQUENCY; THIN FILM BULK ACOUSTIC WAVE RESONATOR; ZINC OXIDE THIN FILM;

ZINC OXIDE;

EID: 0034498248     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (15)

1. T. R. Sliker and D. A. Roberts, J. Appl. Phys., 5, 2350 (1967).
2. K. M. Lakin and J. S. Wang, Appl. Phys. Letters, 38, 125 (1980).
3. Y. Miyasaka, S. Hoshino and S. Takahashi, Jpn. J. Appl. Phys. Suppl., 23, 119 (1983).
4. K. Nakamura, Y. Ohashi and H. Shimizu, Jpn. J. Appl Phys., 25, 371 (1986).
5. J. Shiokawa,Y. Makishima, K. Hashimoto and M. Yamaguchi, Jpn. J. Appl. Phys., 32, 2321 (1993)
6. R. Ruby, P. Bradley J. D. Larson III and Y. Oshmyansky, Electronics Letters, 35, 794 (1999)
7. Y. Yoshino, T. Makino, Y. Katayamà and T. Hata in 5th international Symposium of Sputtering and Plasma Processes (Proc., Kanazawa, Japan, 1999), 233-234.
8. Y. Yoshino in Microelectromechanical Structures for Materials Research, edited by S. Brown, J. Gilbert, H. Guckel, R. Howe, G. Johnson, P. Krulevitch and C. Muhlstein (Mater. Res. Soc. Proc. 518, Pittsburgh, PA, 1998), 9-14.
9. Y. Yoshino, S. Iwasa, H. Aoki, Y. Deguchi, Y. Yamamoto and K. Ohwada in Thin Films-Structure and Morphology, edited by S. C. Moss, D Ila, R. C. Cammarata, E. H. Chason, T. L. Einstein and E. D. Williams (Mater. Res. Soc. Proc. 441, Pittsburgh, PA, 1996), 241-246.
10. Y. Yoshino, K. Inoue, M. Takeuchi, T. Makino, Y. Katayama and T. Hata in 5th international Symposium of Sputtering and Plasma Processes (Proc., Kanazawa, Japan, 1999), 7-8.
11. S. Fujishima, T. Kasanami and T. Nakamura, Jpn. J. Appl. Phys. Suppl. 22, 150 (1983).
12. M. Takeuchi, K. Inoue, Y. Yoshino and K. Ohwada in Microelectromechanical Structures for Materials Research, edited by S. Brown, J. Gilbert, H. Guckel, R. Howe, G. Johnson, P. Krulevitch and C. Muhlstein (Mater. Res. Soc. Proc. 518, Pittsburgh, PA, 1998), 215-220.
13. M. Takeuchi, K. Inoue, Y. Yoshino and K. Ohwada, Vacuum, 51, 565 (1998).
14. T. Hata, T. Minamikawa, E. Noda, O. Morimoto and T. Hada, Jpn. J. Appl. Phys. Suppl. 18, 219 (1979).
15. Y. Yoshino, K. Inoue, M. Takeuchi and K. Ohwada, Vacuum, 51, 601 (1998).