Effect of beam energy and surface temperature on the dissociative adsorption of H2 on Si(001)

Journal of Chemical Physics

Volumn 111, Issue 23, 1999, Pages 10411-10414

  Durr M ^a   Raschke, M B ^a   Hofer U ^a,b  

^a MAX PLANCK INSTITUT FÜR QUANTENOPTIK   (Germany)

^b PHILIPPS UNIVERSITY MARBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038422453     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.480395     Document Type: Article

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