Oxygen plasma asher contamination: An analysis of sources and remedies

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 6, 1996, Pages 3075-3081

  Synowicki, R A ^a   Hale, Jeffrey S ^a   McGahan, William A ^a   Ianno, N J ^a   Woollam, John A ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CONTAMINATION; DEPOSITION; ELLIPSOMETRY; ETCHING; IMPURITIES; METALLIC FILMS; ORBITS; OXYGEN; SILICA; SPECTROPHOTOMETRY; STOICHIOMETRY;

ASHING; LOW EARTH ORBIT; OXYGEN PLASMA ASHER; REFLECTANCE SPECTROPHOTOMETRY;

PLASMA APPLICATIONS;

EID: 0030285706     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580174     Document Type: Article

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