AFM surface imaging of thermally oxidized hydrogenated crystalline silicon

Applied Surface Science

Volumn 191, Issue 1-4, 2002, Pages 148-152

  Szekeres, A ^a   Lytvyn, P ^b   Alexandrova, S ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

Amorphous surfaces; Atomic force microscopy (AFM); Oxidation; Roughness and topography; Silicon; Silicon oxides; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; HYDROGENATION; IMAGING TECHNIQUES; MORPHOLOGY; PLASMAS; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE ROUGHNESS; THERMOOXIDATION;

SURFACE IMAGING;

SURFACE PHENOMENA;

EID: 0037123499     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00169-1     Document Type: Article

References (17)