Characterization of silicon dioxide film by high spatial resolution cathodoluminescence spectroscopy

Journal of Applied Physics

Volumn 92, Issue 12, 2002, Pages 7153-7156

  Yoshikawa, Masanobu ^a   Matsuda, K ^a   Yamaguchi, Y ^a   Matsunobe, T ^a   Nagasawa, Y ^a   Fujino, H ^a   Yamane, T ^a  

^a TORAY RESEARCH CENTER INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODOLUMINESCENCE; DYNAMIC RANDOM ACCESS STORAGE; FILM GROWTH; INTERFACES (MATERIALS); OXIDATION; PARAMAGNETIC RESONANCE; QUARTZ; SEMICONDUCTOR DOPING; SPECTROSCOPIC ANALYSIS;

GATE OXIDE FILMS;

SILICA;

EID: 0037115445     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1520726     Document Type: Article

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