Characterization of fluorine-doped silicon dioxide film by Raman spectroscopy

Thin Solid Films

Volumn 310, Issue 1-2, 1997, Pages 167-170

  Yoshikawa, M ^a   Iwagami, K ^a   Morita, N ^a   Matsunobe, T ^a   Ishida, H ^a  

^a TORAY RESEARCH CENTER INC   (Japan)

Author keywords

Amorphous materials; Optical properties; Raman scattering; silicon oxide

Indexed keywords

FLUORINE; GLASS; QUARTZ; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SEMICONDUCTOR DOPING; STRESS CONCENTRATION;

SILICON DIOXIDE FILMS;

DIELECTRIC FILMS;

EID: 0031274225     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00393-3     Document Type: Article

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