|
|
Volumn 195, Issue 1-4, 2002, Pages 130-136
|
|
Investigation of RF power effect on the deposition and properties of PECVD TiSi 2 thin film
a
a
SAGA UNIVERSITY
(Japan)
|
|
Author keywords
PECVD; SEM; TiSi 2; XPS; XRD
|
|
Indexed keywords
ATOMS;
DISSOCIATION;
INDUCTIVELY COUPLED PLASMA;
INTERFACES (MATERIALS);
MORPHOLOGY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
SILICON;
SUBSTRATES;
SURFACE CHEMISTRY;
THERMODYNAMICS;
TITANIUM COMPOUNDS;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
PLASMA INTENSITY;
THIN FILMS;
|
|
EID: 0037099383
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(02)00544-5 Document Type: Article |
|
Times cited : (7)
|
|
References (8)
|
