Direct phase measurement of the X-ray specular reflection using modulation under the Bragg condition

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 5 B, 2002, Pages

  Yashiro, Wataru ^a   Shimizu, Keisuke ^b   Hirano, Keiichi ^a   Takahashi, Toshio ^c  

^a UNIVERSITY OF TOKYO   (Japan)

^b INSTITUTE OF MATERIALS STRUCTURE SCIENCE   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Amorphous thin films; Phase problem; Surface structure; Thin film structures; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; LIGHT REFLECTION; NANOSTRUCTURED MATERIALS; PHASE MODULATION; SINGLE CRYSTALS; VECTORS; X RAY DIFFRACTION ANALYSIS;

BRAGG REFLECTIONS; DIRECT PHASE MEASUREMENTS; X-RAY SPECULAR REFLECTIONS;

SURFACE STRUCTURE;

EID: 0037095568     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l592     Document Type: Article

References (18)