Fabrication of ramp-type junctions using a two angle ion beam etching process

Superconductor Science and Technology

Volumn 12, Issue 11, 1999, Pages 1016-1019

  Schoop, U ^a   Schonecke, M ^a   Schymon, S ^a   Bauch, T ^a   Marx, A ^a   Wiedenhorst, B ^a   Alff, L ^a   Gross, R ^a  

^a UNIVERSITY OF COLOGNE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; ELECTRODES; ETCHING; FABRICATION; OXIDE SUPERCONDUCTORS; STRONTIUM COMPOUNDS; SURFACE CLEANING; TRANSMISSION ELECTRON MICROSCOPY; YTTRIUM BARIUM COPPER OXIDES;

BILAYERS; PULSED LASER DEPOSITION; TWO ANGLE ION BEAM ETCHING;

JOSEPHSON JUNCTION DEVICES;

EID: 0033226249     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/12/11/396     Document Type: Article

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