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Volumn 149, Issue 2-3, 2002, Pages 129-134
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Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane
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Author keywords
Chemical vapour deposition; Ethynyltrimethylsilane; Laser; Polycarbosilane films
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Indexed keywords
ATMOSPHERIC PRESSURE;
CHEMICAL VAPOR DEPOSITION;
FABRICATION;
GLASS;
POLYCARBONATES;
POLYMERIZATION;
POLYCARBOSILANE FILMS;
COATINGS;
CHEMICAL ANALYSIS;
FILM;
LASER;
POLYMERIZATION;
PRESSURE;
VAPOR DEPOSITION;
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EID: 0037080597
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(01)01495-5 Document Type: Article |
Times cited : (5)
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References (23)
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