IR laser-induced decomposition of prop-2-enylsilane and ethynylsilane for chemical vapour deposition of Si/C phases

Journal of Materials Chemistry

Volumn 7, Issue 8, 1997, Pages 1415-1420

  Pola, Josef ^a   Vítek, Josef ^a   Bastl, Zdeněk ^b   Urbanova M ^a   Šubrt, Jan ^c   Taylor, Roger ^d  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^d UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001189330     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a700370f     Document Type: Article

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