IR laser-induced decomposition of disiloxane for chemical vapour deposition of poly(hydridosiloxane) films

Applied Organometallic Chemistry

Volumn 13, Issue 9, 1999, Pages 655-658

  Pola, Josef ^a   Urbanová, Markéta ^a   Dřínek, Vladislav ^a   Šubrt, Jan ^b   Beckers, Helmut ^c  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^c UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Chemical vapour deposition; Decomposition; Disiloxane; Polyhydridosiloxane films

Indexed keywords

EID: 0001641103     PISSN: 02682605     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0739(199909)13:9<655::AID-AOC893>3.0.CO;2-0     Document Type: Article

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