Erosion of amorphous hydrogenated boron-carbon thin films

Journal of Nuclear Materials

Volumn 231, Issue 1-2, 1996, Pages 151-154

  Annen, A ^a   Von Keudell, A ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DENSITY (SPECIFIC GRAVITY); ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; HELIUM; HYDROGEN; ION BEAMS; METHANE; PLASMAS;

BORONIZATION; ELASTIC RECOIL DETECTION; ION BEAM ANALYSIS; NUCLEAR REACTION ANALYSIS; PRECURSOR GASES; PROFILOMETER; RADIO FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0030198262     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3115(96)00389-3     Document Type: Letter

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