Composition, structure and annealing-induced phase separation in SiOx films produced by thermal evaporation of SiO in vacuum

Vacuum

Volumn 68, Issue 1, 2002, Pages 1-9

  Nesheva, D ^a   Bineva, I ^a   Levi, Z ^a   Aneva, Z ^a   Merdzhanova, Ts ^b   Pivin, J C ^c  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^c 91405 Orsay Campus   (France)

Author keywords

Infrared absorption; Rutherford backscattering; Si nanoparticles; Vacuum deposition

Indexed keywords

ANNEALING; EVAPORATION; INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PHASE SEPARATION; RAMAN SCATTERING; SILICA; THIN FILMS;

THERMAL EVAPORATION;

VAPOR DEPOSITION;

EID: 0037078275     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00266-X     Document Type: Article

References (26)

1. Javadi H.H.S., McGrath W.R., Bumble B., LeDuc H.G. Appl Phys Lett. 61:1992;2172-2174.
2. Wecht K.W. Appl Opt. 30:1991;4133.
3. Lee C.T., Huang C.T., Chen J.Y. J Appl Phys. 84:1998;1204.
4. Canham L.T. Appl Phys Lett. 57:1990;1046-1048.
5. Zacharias M., Freistdt H., Stolze F., Drusedau T.P., Rosenbauer M., Stutzmann M. J Non-Cryst Solids. 164-166:1993;1089-1092.
6. Kenyon A.J., Trwoga P.F., Pitt C.W., Rehm G. J Appl Phys. 79:1996;9291.
7. Shimizu-Iwayama T., Fujita K., Nakao S., Saitoh K., Fujita T., Itoh N. J Appl Phys. 75:1994;7779.
8. Hirata T. J Phys Chem Solids. 58:1997;1497-1501.
9. Murakami K., Suzuki T., Makimura T., Tamura M. Appl Phys A. 69(Suppl):1999;S13-S15.
10. Wehrspohn R.B., Zhu M., Godet C. J Lumin. 80:1999;449-453.
11. Rinnert H., Vergnat M., Marchal G. Appl Phys Lett. 72:1998;3157-3159.
12. Rinnert H., Vergnat M., Marchal G., Burneau A. J Lumin. 80:1999;445-448.
13. Kahler U., Hofmeister H. Appl Phys Lett. 75:1999;641-643.
14. Kahler U., Hofmeister H. Opt Mater. 17:2001;83-86.
15. Nakamura M., Mochizuki Y., Usami K., Itoh Y., Nozaki T. Solid State Commun. 50:1984;1079-1081.
16. Iacona F., Franzo G., Spinella C. J Appl Phys. 87:2000;1295-1303.
17. Rinnert H., Vergnat M., Marchal G. Mater Sci Eng B. 69-70:2000;484-488.
18. Schumann L., Lehmann A., Sobotta H., Riede W., Teschner U., Hubner K. Phys Status Solidi B. 110:1982;K69-K71.
19. Lehmann A., Schumann L., Hubner K. Phys Status Solidi B. 121:1984;505-511.
20. Shabalov A.L., Feldman M.S. Thin Solid Films. 151:1987;317-323.
21. Tsu D.V., Lucovsky G., Davidson B.N. Phys Rev B. 40:1989;1795-1805.
22. Haga K., Watanabe H. J Non-Cryst Solids. 195:1996;72-75.
23. Moreno J.A., Garrido B., Samitier J., Morante J.R. J Appl Phys. 81:1997;1933-1942.
24. Brunet-Bruneau A., Fisson S., Vuye G., Rivory J. J Appl Phys. 87:2000;7303-7309.
25. Iqbal Z., Veprek S. J Phys C. 15:1982;377.
26. Veprek S. Thin Solid Films. 297:1997;145.