New doping method for subhalf micron trench sidewalls by using an electron cyclotron resonance plasma

Applied Physics Letters

Volumn 53, Issue 21, 1988, Pages 2059-2061

  Mizuno, B ^a   Nakayama, I ^a   Aoi, N ^a   Kubota, M ^a   Komeda, T ^a  

^a PANASONIC CORPORATION   (Japan)

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EID: 33747577711     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.100318     Document Type: Article

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