Thermal stability of electrode stacks for application in oxide film devices

Thin Solid Films

Volumn 406, Issue 1-2, 2002, Pages 268-274

  Song, Zhi Tang ^a,b   Chong, Nui ^a   Wong Chan, Lai Wah Helen ^a   Choy, Chung Loong ^a   Lin, Cheng Lu ^b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Multilayers; Resistivity; Sputtering; Surface morphology

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; DIFFUSION; ELECTRIC CONDUCTIVITY; FERROELECTRIC THIN FILMS; GRAIN GROWTH; MAGNETRON SPUTTERING; SILICA; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; TITANIUM DIOXIDE; ZIRCONIA;

ELECTRODE STACKS; OXIDE FILMS;

ELECTRODES;

EID: 0037051212     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01780-1     Document Type: Article

References (10)