SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 14, Issue 19, 2002, Pages 1418-1421

Ultrafine and well-defined patterns on silicon through reaction selectivity

(3) Prabhakaran, K a Hibino, H a Ogino, T a

a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC PHYSICS; CHEMICAL BONDS; ETCHING; MOLECULAR STRUCTURE; NITRIDING; NUCLEATION; SURFACE REACTIONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTION SELECTIVITY; SILICON ATOMS; SILICON SURFACES; ULTRAFINE PATTERNS;

SILICON;

EID: 0037010142 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(20021002)14:19<1418::AID-ADMA1418>3.0.CO;2-S Document Type: Article

Times cited : (3)

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