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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 12, 2002, Pages 7496-7500

Electron tunneling through an Al2O3 thin film on NiAl(110) in scanning tunneling microscopy

(2) Iwasaki, Hiroshi a Sudoh, Koichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Al2O3; Calculation; Electron tunneling; Insulator; NiAl; STM

Indexed keywords

ELECTRON TUNNELING; NICKEL COMPOUNDS; PROBABILITY; SCANNING TUNNELING MICROSCOPY; THIN FILMS;

TRANSMISSION PROBABILITY;

ALUMINUM COMPOUNDS;

EID: 0036994723 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.7496 Document Type: Article

Times cited : (17)

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