Surface interaction forces in chemical-mechanical planarization

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 529-532

  Rajan, Krishna ^a   Singh, Rajiv ^b   Adler, J ^b   Mahajan, U ^b   Rabinovich, Y ^b   Moudgil, B M ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b University of Florida   (United States)

Author keywords

Atomic force microscopy; Chemical mechanical planarization; Oxide; Surface potential

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDRATION; MOLECULAR DYNAMICS; OXIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL MECHANICAL PLANARIZATION; SURFACE INTERACTION FORCES;

CHEMICAL POLISHING;

EID: 0031245788     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00501-4     Document Type: Article

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