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Volumn 716, Issue , 2002, Pages 305-310

Electrically induced junction MOSFET for high performance sub-50nm CMOS technology

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DEGRADATION; ELECTRIC CONDUCTIVITY; OXIDES; POLYSILICON; THICKNESS MEASUREMENT;

EID: 0036955670     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b7.6     Document Type: Conference Paper
Times cited : (1)

References (8)
  • 2
    • 0012544394 scopus 로고    scopus 로고
    • Integrated Systems Engineering AG, Technoparkstrasse 1, CH-8005 Zurich / Switzerland
    • ISE TCAD User's Manual-Release 6(1, 3, 4, 5), Integrated Systems Engineering AG, Technoparkstrasse 1, CH-8005 Zurich / Switzerland.
    • ISE TCAD User's Manual-Release , vol.6 , Issue.1-5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.