Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 190, Issue 1-4, 2002, Pages 339-344

  Teo, E J ^a   Alkaisi, M ^b   Bettiol, A A ^a   Osipowicz, T ^a   Van Kan, J ^a   Watt, F ^a   Markwitz, A ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSITY OF CANTERBURY   (New Zealand)

^c GNS SCIENCE   (New Zealand)

Author keywords

Channeling contrast microscopy; Composition; Crystal quality; Reactive ion etched; Topography

Indexed keywords

CHARACTERIZATION; COMPOSITION EFFECTS; CRYSTAL LATTICES; CRYSTALLIZATION; MICROSCOPIC EXAMINATION; REACTIVE ION ETCHING; SUBSTRATES;

SUB-MICRON CHANNELING;

CRYSTAL MICROSTRUCTURE;

EID: 0036569311     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)01255-1     Document Type: Conference Paper

References (7)