Diffusion studies of Cu in Si and low-k dielectric materials

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 395-400

  Prasad, K ^a   Yuan, X L ^a   Tan, C M ^a   Zhang, D H ^a   Li, C Y ^b   Wang, S R ^b   Yuan, S Y J ^b   Xie, J L ^b   Gui, D ^b   Foo, P D ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; DIELECTRIC MATERIALS; DIFFUSION IN SOLIDS; SOLUBILITY; TEMPERATURE;

BLACK DIAMOND; COPPER SILICIDE;

SEMICONDUCTING SILICON;

EID: 0036946126     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-716-b8.3     Document Type: Conference Paper

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