Amorphous and microcrystalline silicon solar cells grown by pulsed PECVD technique

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 611-616

  Das, Ujjwal K ^a   Morrison, Scott ^a   Madan, Arun ^a  

^a MVSystems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL GROWTH; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; ELECTRONIC DENSITY OF STATES; GRAIN BOUNDARIES; ION BOMBARDMENT; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THICKNESS MEASUREMENT;

AMORPHOUS SOLAR CELLS; CHAMBER DEPOSITION SYSTEM; FILM CHANGES; GAS UTILIZATION RATE; GROWTH RATE; MICROCRYSTALLINE SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 0036924608     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a26.6     Document Type: Conference Paper

References (7)

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