On mechanism of nickel diffusion during metal induced lateral crystallization of amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 715, Issue , 2002, Pages 229-232

  Myasnikov, A M ^a,b   Poon, M C ^b   Chan, P C ^b   Ng, K L ^b   Chan, M S ^b   Chan, W Y ^b   Singla, S ^b   Yuen, C Y ^b  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; DIFFUSION; NICKEL; RECRYSTALLIZATION (METALLURGY); SINGLE CRYSTALS;

METAL INDUCED LATERAL CRYSTALLIZATION; NICKEL DIFFUSION; NICKEL PENETRATION;

AMORPHOUS SILICON;

EID: 0036920093     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-715-a22.11     Document Type: Conference Paper

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