Change in the nature of the Ni diffusion mechanism on the Si(111) surface with adsorption of Co atoms

JETP Letters

Volumn 66, Issue 9, 1997, Pages 643-646

  Dolbak, A E ^a   Ol'shanetskii B Z ^a   Tiis S A ^a   Zhachuk, R A ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000003848     PISSN: 00213640     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.567574     Document Type: Article

References (11)

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