CAD computation for manufacturability: Can we save VLSI technology from itself?

IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers

Volumn , Issue , 2002, Pages 424-431

  Lavin, Mark ^a   Liebmann, Lars ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CELL DESIGN; PHOTOMASKS;

ALGORITHMS; CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; INTEGRATED CIRCUIT MANUFACTURE; MASKS; PHOTOLITHOGRAPHY;

VLSI CIRCUITS;

EID: 0036916525     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/774572.774635     Document Type: Conference Paper

References (9)

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