XPS study of electron-induced surface processes in trimethylsilane-covered Ge(100) surfaces

Surface and Interface Analysis

Volumn 33, Issue 12, 2002, Pages 940-944

  Wang, P W ^a   Qi, Y ^b   Craig Jr , J H ^a  

^a BRADLEY UNIVERSITY   (United States)

^b University of Massachusetts   (United States)

Author keywords

Electron induced surface processes; Ge (100); Trimethylsilane; XPS

Indexed keywords

CHEMICAL BONDS; ELECTRON BEAMS; ELECTRON IRRADIATION; GERMANIUM; MULTILAYERS; SEMICONDUCTOR GROWTH; SILANES; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON-INDUCED SURFACE PROCESSES;

SURFACE CHEMISTRY;

EID: 0036902081     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1469     Document Type: Article

References (11)

1. Delplancke M.P., Vandentop J.M., Somorjai G.A. Thin Solid Films 1991; 202: 289.
2. Ascherl M.V., Campbell J.H., Craig J.H. Jr. Appl. Surf. Sci. 1994; 74: 121.
3. Campbell J.H., Ascherl M.V., Craig J.H. Jr. J. Vac. Sci. Technol. 1994; A12: 2128.
4. Wang P.W., Bater S., Zhang L.P., Ascherl M., Craig J.H. Jr. Appl. Surf. Sci. 1995; 90: 413.
5. Somorjai G.A. Chemistry in Two Dimensions: Surfaces, Cornell University: Cornell, Ithaca, NY, 1981.
6. Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., Muilenberg G.E. Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer: Eden Prairie, MN, 1979; 52.
7. Renlund G.M., Prochazka S., Doremus R.H. J. Mater. Res. 1991; 6: 2723.
8. Huheey J.E., Kecter E.A., Recter R.L. In Inorganic Chemistry, Harper Collins: New York, 1993; 187-190.
9. Sugahara S., Kitamura T., Imai S., Uchida Y., Matsumura M. Appl. Surf. Sci. 1996; 107: 137.
10. Qi Y., Sulak J., Durrer W.G., Craig J.H. Jr., Wang P.W. Surf. Interface Anal. 1998; 26: 113.
11. Ateca S., Bater C., Sanders M., Graig J.H. Jr. Surf. Interface Anal. 2000; 29: 194.