Initial adsorption of trimethylsilane on Ge(100) surfaces

Surface and Interface Analysis

Volumn 26, Issue 2, 1998, Pages 113-120

  Qi, Y ^a   Sulak, J L ^a   Durrer, W G ^a   Craig Jr , J H ^a   Wang, P W ^a  

^a UNIVERSITY OF TEXAS AT EL PASO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BOND STRENGTH (CHEMICAL); CHEMICAL BONDS; ELECTRONS; SEMICONDUCTING GERMANIUM; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

TRIMETHYLSILANE;

SILANES;

EID: 0032002103     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199802)26:2<113::AID-SIA350>3.0.CO;2-U     Document Type: Article

References (20)