Metrology of pulsed radiation for 157-nm lithography

Applied Optics

Volumn 41, Issue 34, 2002, Pages 7167-7172

  Richter, Mathias ^a   Kroth, Udo ^a   Gottwald, Alexander ^a   Gerth, Christopher ^b   Tiedtke, Kai ^b   Saito, Terubumi ^c   Tassy, Ivan ^d   Vogler, Klaus ^d  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b DESY   (Germany)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^d Lambda Physik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENICS; ELECTRONS; MEASUREMENTS; PHOTODETECTORS; PULSED LASER APPLICATIONS; RADIOMETERS; STABILITY; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

ELECTRON-STORAGE RINGS;

LITHOGRAPHY;

EID: 0036901766     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.007167     Document Type: Article

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