Advanced F2-lasers for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Vogler, Klaus ^a   Uwe, Stamm ^a   Bragin, Igor ^a   Voss, Frank ^a   Govorkov, Sergei ^a   Hua, Gongxue ^a   Kleinschmidt, Juergen ^a   Paetzel, Rainer ^a  

^a Lambda Physik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; GAS LASERS; INTERFEROMETRY; LASER BEAMS; LASER RESONATORS; LIGHT TRANSMISSION; PROJECTION SYSTEMS; REFRACTIVE INDEX;

CATADIOPTRIC PROJECTION SYSTEMS; SOLID STATE PULSED POWER MODULES; SPECTRAL BANDWIDTH; SPECTRAL METROLOGY; STABILIZED POWER OUTPUT;

PHOTOLITHOGRAPHY;

EID: 0033712155     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)