Characterization of porous structure in ultra-low-κ dielectrics by depositing thin conductive cap layers

Microelectronic Engineering

Volumn 65, Issue 1-2, 2002, Pages 123-131

  Iacopi, Francesca ^a,b   Tokei Zs ^a   Stucchi, M ^a   Brongersma, S H ^a   Vanhaeren, D ^a   Maex, K ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Porous structure; Ultra low films

Indexed keywords

CONDUCTIVE FILMS; ELECTRIC RESISTANCE; MESOPOROUS MATERIALS; SPUTTERING; SURFACE ROUGHNESS;

CONDUCTIVE CAP LAYERS;

DIELECTRIC FILMS;

EID: 0036892622     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00745-1     Document Type: Article

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