3D-microstructure replication processes using UV-curable acrylates

Microelectronic Engineering

Volumn 65, Issue 1-2, 2002, Pages 163-170

  Elsner, C ^a   Dienelt, J ^a   Hirsch, D ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

3D microstructure replication; Acrylates; Replica moulding; UV curing

Indexed keywords

MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYACRYLATES; ULTRAVIOLET RADIATION;

REPLICA MOULDING;

NANOSTRUCTURED MATERIALS;

EID: 0036892519     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00848-1     Document Type: Article

References (11)

1. Chou S.Y., Krauss P.R., Renstrom P.J. J. Vac. Sci. Technol. B. 14:(6):1996;4129.
2. Kumar A., Whitesides G.M. Appl. Phys. Lett. 63:1993;2002.
3. Haisma J., Verheijen M., van den Heuvel K., van den Berg J. J. Vac. Sci. Technol. B. 14:(6):1996;4124.
4. Braun A., Zimmer K., Hösselbarth B., Meinhardt J., Bigl F., Mehnert R. Appl. Surf. Sci. 127-129:1998;911.
5. Rudschuk S., Hirsch D., Zimmer K., Otte K., Braun A., Mehnert R., Bigl F. Microelectron. Eng. 53:2000;557-560.
6. Zimmer K., Otte K., Braun A., Rudschuck S., Friedrich H., Schulz H., Scheer H.-C., Hoffmann T., Sotomayor Torres C.M., Mehnert R., Bigl F. McKeown P. Proceedings of the 1st International EUSPEN Conference. Vol. 1:1999;534.
7. Mehnert R., Naumov S., Knolle W., Janovsky I. Macromol. Chem. Phys. 201:2000;2447-2454.
8. Jaszewski R.W., Schift H., Schnyder B., Schneuwly A., Gröning P. Appl. Surf. Sci. 143:1999;301.
9. Man P.F., Gogoi B.P., Mastrangelo C.H. J. Micromech. Syst. 6:(1):1997;25.
10. Brzoska J.B., Ben Azouz I., Rondelez F. Langmuir. 10:1994;4367-4373.
11. Boyd I.W., Zhang J.Y. Nucl. Instrum. Methods Phys. Res. B. 121:1997;349-356.